The high-power pulsed magnetron sputtering power supply works in the high-frequency conversion mode, and the adjustment of the DC output and the power supply current is realized by changing the pulse width of the high-frequency conversion. At present, the power supply used in magnetron sputtering film forming process is DC magnetron sputtering power supply, intermediate frequency magnetron sputtering power supply, unipolar pulsed magnetron sputtering power supply, high-power pulsed magnetron sputtering power supply has good load characteristics. , Cost-effective, suitable for use in metal and reactive film environments. The ion energy is only about a few electron volts, the formed plasma has a low dissociation rate and poor controllability. The sputtering materials are mainly neutral atoms/radicals. The sputtering mechanism is a kinetic energy power supply and the voltage range is below Ikv, which makes it difficult to optimize the deposition. The quality and performance of the film, then, let’s learn about the production method of the high-power pulsed magnetron sputtering power supply!

Although the energy level of general sputtering materials is only electron volts, the energy level of high-power pulsed magnetron sputtering materials is as large as 100 electron volts, so the big advantage is that it can coat high-density films without significantly increasing the substrate. surface temperature. It is necessary to develop a high-power magnetron sputtering power supply that meets the above technical requirements. High-power pulsed magnetron sputtering technology has become a frontier and hot spot in the field of magnetron sputtering research, but to achieve this technology, the power supply method uses ball gap switches and pulse forming lines, which has inherent shortcomings: the switch of ball gap switches The repetition frequency is as low as tens of Hz, with high repetition frequency and

High-power pulsed magnetron sputtering power supply is used for high-power magnetron sputtering power supply with a frequency of 100Hz; the opening and closing time of the ball gap switch cannot be controlled, and the trigger is difficult and unstable. Sometimes the trigger voltage is adjusted repeatedly according to different gap gas pressures And current; there is jitter, the pulse width cannot be adjusted, and the use of high-power magnetron sputtering power supplies has great limitations; the ball gap switch has a short life, large maintenance volume, low efficiency, and heavy weight, which is very important for the installation environment and Strict space requirements.

The purpose of the utility model is to address the shortcomings of the current technology. The utility model is realized through the following key technologies. One of the key technologies is to provide a fully digital high-power unipolar pulsed magnetron sputtering power supply with stable performance, high efficiency, simple structure and long life. Series resonant inverter charging power supply,

The following is a description of the main technical functions and characteristics of the high-power pulsed magnetron sputtering power supply:

1. Series resonant inverter charging power supply. The charging current at the end of charging is very small, and the impedance is driven by infinitely large. It is provided for constant voltage charging and the charging power supply with drastic current changes. A large power resistance is connected in series between the load and the charging power supply. There are many cases of current limiting. Therefore, because the storage network is a load with a drastic change in impedance, it is close to a short circuit at the beginning of charging, and the impedance is almost 0. The efficiency of the current limiting resistor heating charging power supply is low, the above-mentioned efficiency, and the bulk are huge. The bulky constant voltage charging method has been difficult to meet the practical application. With the increase of the repetition frequency of 50%, large and large magnetron sputtering power supply and the expansion of pulse power, it has the characteristics of constant current charging, small size, high efficiency and reliability. It has high performance, high power density, and is not afraid of short circuits. It is suitable for loads with a wide range of impedance changes and is an ideal charging power source. In this regard, the technical route of the utility model-series resonant inverter charging power supply is proposed. Full digital high output unipolar pulsed magnetron sputtering power supply, including solid semiconductor switches composed of EMI filter circuit, three-phase bridge rectifier circuit, low frequency DC filter circuit, series resonant inverter charging circuit, power storage circuit, and IGBT And DSP digital signal processing circuit; The input end of the EMI filter circuit is the total input end, the output end of the three-phase bridge rectifier circuit is connected to the input end of the low-frequency DC filter circuit, and the three-phase five-wire AC power supply is connected to the output end Connect the input end of the three-phase bridge rectifier circuit; The output end of the low-frequency DC filter circuit is connected to the input end of the series resonant inverter charging circuit; The output end of the solid semiconductor switch composed of IGBT is the total output end, and the series resonant inverter charging The output terminal of the circuit is connected to the input terminal of the storage circuit via a high-frequency step-up transformer (t), a solid semiconductor switch composed of IGBT is connected to the output terminal of the storage circuit, and the DSP digital signal processing circuit is respectively connected to the functional circuit Make communication connections. High-power pulsed magnetron sputtering power supply

3. Series resonant inverter charging circuit: It has a resonant full bridge composed of a series capacitor CX, an inductor LX, and 4 IGBTs. The center of the resonant full bridge is the output terminal, and the resonant capacitor and the input terminal of the step-up transformer are used for DC filtering. The device is connected to the collector of the IGBT 1. An all-digital high-output unipolar pulsed magnetron sputtering power supply, characterized in that the emitter is directly connected to the output of the low-frequency DC filter circuit as a negative terminal, and the grid is connected with a DSP digital signal deal with

4. In the all-digital high-output unipolar pulsed magnetron sputtering power supply, the structure of the storage circuit constitutes an inverted l-type storage network composed of the storage capacity CD1, LD1 and CD1 of the storage inductor LDp, The connection point is the output end, the storage inductor LD1

Detailed ways

High-power pulse magnetron sputtering power supply is mainly composed of EMI filter circuit, three-phase bridge rectifier circuit, DC filter circuit, series resonant inverter charging circuit, energy storage circuit, solid semiconductor switch composed of IGBT, etc.

Abstract This utility model provides an all-digital high-output unipolar pulsed magnetron sputtering power supply, which uses DSP high-speed digital signal processing circuit to coordinate and control various functional circuits, including EMI filter circuit, three-phase bridge rectifier circuit, Low-frequency DC filter circuit, series resonant inverter circuit, energy storage circuit, solid semiconductor switch composed of IGBT and DSP digital signal processing circuit. The utility model has stable performance, high efficiency and simple structure, so that high-power unipolar pulsed magnetron sputtering The power supply works in an orderly and reliable manner, ensuring the stability and uniformity of the film quality, and improving the frequency and power of the high-power pulse power supply.

The above is the production method of high-power pulsed magnetron sputtering power supply, if you need to know more, please feel free to contact us!