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The DC magnetron sputtering power supply works in the high frequency conversion mode. The DC output and the adjustment of the power supply current are realized by changing the pulse width of the high frequency conversion. Then, let's learn about the production method of the DC magnetron sputtering power supply!
The high-power pulsed magnetron sputtering power supply uses a rectangular wave voltage pulsed power supply instead of the traditional DC power supply for magnetron sputtering deposition. The high-power pulsed magnetron sputtering power supply technology can effectively suppress the generation of arcs, eliminate the resulting film defects, and at the same time increase the sputtering deposition speed, reduce the deposition temperature and a series of significant advantages, then, let's understand the next high How does the power pulse magnetron sputtering power supply work!
Magnetron sputtering film forming process uses DC magnetron sputtering power supply, intermediate frequency magnetron sputtering power supply, unipolar pulse magnetron sputtering power supply, sputtering materials are mainly neutral atoms/radicals, sputtering The mechanism is that the voltage range of the kinetic energy power supply is below Ikv, and the ion energy is only about a few electron volts. The formed plasma has a low dissociation rate and poor controllability. It is difficult to optimize the quality and performance of the deposited film. How to make a sputtering power supply!
On June 18, 2015, our company successfully passed the ISO9001:2008 quality system certification. Through this quality system certification, our company will continue to work hard to meet the following requirements: 1. Strengthen the customer-centered concept, clearly understand customer requirements, meet customer requirements or even exceed customer requirements through the operation of each process in the system, and obtain customer satisfaction procedures through customer satisfaction measurement, so as to continuously improve the company’s Position in the hearts of customers and improve higher-quality services; 2. It is clearly required that the company’s management directly participate in the quality management system activities, formulate quality policies and quality objectives, and take timely measures for system deficiencies, which strengthened the company’s development in all aspects 3. Clarify the responsibilities of various functions and levels of personnel, and clarify the competence requirements of various personnel in terms of education, training, skills and experience, to ensure that all employees participate in the establishment, operation and maintenance of the entire quality system, and ensure The smooth operation of all aspects of the company; 4. Clearly control each link of the unqualified products in the production process, deal with the unqualified products produced, and through institutionalized data analysis, find the root cause of the unqualified products, and prevent the occurrence of unqualified products through corrective or preventive measures. Reoccurred, thereby continuously reducing the cost of poor quality incurred by the company, and continuously improving the effectiveness and efficiency of the quality management system through other continuous improvement activities 5. The successful establishment of the ISO9001 quality system makes the company's development further, and we will continue to work hard to create more wealth and glory for the vacuum industry.
Founded in 2012, Tangshan Biaoxian Electronics Co., Ltd. is a high-tech enterprise integrating R&D, manufacturing, and marketing. In 2014, it was rated as a small and medium-sized technology-based enterprise in Hebei Province. In 2017 and 2020, it was continuously rated as a high-tech enterprise in Hebei Province. enterprise. The company's predecessor was the Zunhua City Sanshi Electronic Technology Research Institute founded in 2001, with more than ten years of manufacturing history of vacuum coating power supplies. The company is located in the Yanshan Nanyuan-Zunhua city with superior geographical location, convenient transportation and beautiful environment. The company covers an area of 12,000 square meters and has more than 50 employees, of which 30% are product developers. The company's products have been distributed all over the country and exported to all parts of the world. Over the years, Biaoxian has always focused on the research of electronic equipment and related processes in the field of surface treatment of materials such as vacuum plasma and electrochemistry. Adhering to technological innovation to promote product renewal has effectively enhanced the company's position in this field. At present, the company can produce nine categories, more than 70 types of power products and electronic equipment, of which the peak power of high-power pulse power has been extended to the megawatt level. The company has obtained 18 national patents, one of which is an invention patent, and has passed ISO9001: 2015 quality management system certification. With the growth of the company's R&D team and dedicated efforts, the company will continue to launch a new generation of products. "Stability, Innovation" is our principle, and at the same time, we insist on consistently providing our customers with high-quality and comprehensive services. We have established a complete marketing network and service system throughout the country to ensure that we provide customers with convenient, fast and thoughtful full service.
The DC magnetron sputtering power supply is a kind of physical vapor deposition. Metals, semiconductors, insulators and other materials are usually manufactured by general sputtering methods, which are characterized by relatively simple equipment, not difficult to control, large plating area, and strong adhesion. The DC magnetron sputtering power supply realizes high speed, low temperature and low damage. Since high-speed sputtering is performed under low pressure, the dissociation rate of the gas must be effectively increased. Magnetron sputtering introduces a magnetic field to the surface of the target cathode and uses the magnetic field to confine the charged particles to increase the plasma density and thereby increase the sputtering rate. Then, let's understand the principle of the DC magnetron sputtering power supply!