Description

BSPH series high-power pulsed magnetron sputtering power supply technical specifications

The BSPH series high-power pulsed magnetron sputtering (HiPMIS, HPPMS) power supply operates in a two-stage high-frequency conversion mode with DC pulse output. A single pulse can deliver peak power of 2 to 8 megawatts. The high power density of the cathode material will produce a high rate of metal ionization and does not contain target particles. The coatings prepared by this series of power supplies exhibit good adhesion and density, and can be used for the preparation of a variety of functional films and high-end decorative film layers. The BSPH series high-power pulsed magnetron sputtering power supply can switch between constant peak current and constant voltage output modes. It is possible for multiple HiPMIS power supplies to operate with synchronized frequency and width output. Of course, multiple units can also operate independently, providing excellent combinability and adaptability to the field.

Power supply capacity range

20/40/60/80KW

Input power supply

Three-phase four-wire system 380V±10% 50-60Hz

Output mode

Unipolar narrow pulse

Pulse width

5-250uS

Pulse frequency

10-1000Hz

Output voltage

No-load 1000-2000V

Output current

1200A 2400A 3600A 4800A

Output characteristics

Constant Peak Current / Constant Voltage

Arc extinguishing time

≤1uS

Duty cycle

100%

Cooling method

Water cooling

Operating environment

Environmental Temperature: 0-40°C

Environmental Humidity: Relative humidity ≤ 85%

Air Cleanliness: No dust, non-corrosive, flammable gases, with good ventilation.

Communication method

RS485/RS232

The output power of the power supply can be adjusted according to the usage requirements.

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